Technical Documents

 

Date Document Title Type  Download
11/2015
A novel technique exploiting C–V, G–V and I–V simulations to investigate defect distribution and native oxide in high-κ dielectrics for III–V MOSFETs
Scientific Paper
06/2015
Microscopic Modeling of HfOx RRAM Operations: From Forming to Switching
Scientific Paper
07/2014
A Charge-Trapping Model for the Fast Component of Positive Bias Temperature Instability (PBTI) in High-k Gate-Stacks
Scientific Paper
12/2013
A simulation framework for modeling charge transport and degradation in high-k stacks
Scientific Paper
10/2013
Identifying the First Layer to Fail in Dual Layer SiOx/HfSiON Gate Dielectric Stacks
Scientific Paper
05/2013
Microscopic Modeling of Electrical Stress -Induced Breakdown in Poly-Crystalline Hafnium Oxide Dielectrics
Scientific Paper
05/2013
Charge Transport and Degradation in HfO2 and HfOx Dielectrics
Scientific Paper
09/2011
A Physical model of the temperature dependence of the current through SiO2/HfO2 stacks
Scientific Paper
09/2011
A Comprehensive Understanding of the Erase of TANOS Memories Through Charge Separation Experiments and Simulations
Scientific Paper